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Physics of Plasmas / Volume 15 / Issue 5 / INVITED PAPERS / Lasers, Particle Beams, Accelerators, Radiation Generation

Phys. Plasmas 15, 056708 (2008); http://dx.doi.org/10.1063/1.2907154 (11 pages)

Plasma physics and radiation hydrodynamics in developing an extreme ultraviolet light source for lithography a

a Paper TI2 4, Bull. Am. Phys. Soc. 52, 275 (2007).
Katsunobu Nishihara1, Atsushi Sunahara2, Akira Sasaki3, Masanori Nunami1, Hajime Tanuma4, Shinsuke Fujioka1, Yoshinori Shimada2, Kazumi Fujima5, Hiroyuki Furukawa1, Takako Kato6, Fumihiro Koike7, Richard More6, Masakatsu Murakami1, Takeshi Nishikawa8, Vasilii Zhakhovskii1, Kouhei Gamata1, Akira Takata1, Hirofumi Ueda1, Hiroaki Nishimura1, Yasukazu Izawa1, Noriaki Miyanaga1, and Kunoki Mima1

1Institute of Laser Engineering, Osaka University, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
2Institute for Laser Technology, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
3Advanced Photon Research Center, Kansai Research Establishment, Japan Atomic Energy Agency, 8-1 Umemidai Kizu-cho, Soraku-gun, Kyoto 619-0215, Japan
4Department of Physics, Tokyo Metropolitan University, 1-1 Minami-Ohsawa, Hachoji, Tokyo 192-0397, Japan
5Faculty of Engineering, Yamanashi University, 4-4-37, Takeda, Kofu, Yamanashi 400-8510, Japan
6National Institute of Fusion Science, 322-6, Oroshi-cho, Toki, Gifu 509-5292, Japan
7Physics Laboratory, School of Medicine, Kitazato University, 1-15-1 Kitasato, Sagamihara, Kanagawa 228-8555, Japan
8Department of Electrical and Electronic Engineering, Okayama University, 1-1 Naka 1-chome, Tsushima, Okayama 700-8530, Japan

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(Received 27 November 2007; accepted 18 March 2008; published online 30 May 2008)

Extreme ultraviolet (EUV) radiation from laser-produced plasma (LPP) has been thoroughly studied for application in mass production of next-generation semiconductor devices. One critical issue for the realization of an LPP-EUV light source for lithography is the conversion efficiency (CE) from incident laser power to EUV radiation of 13.5-nm wavelength (within 2% bandwidth). Another issue is solving the problem of damage caused when debris reaches an EUV collecting mirror. Here, we present an improved power balance model, which can be used for the optimization of laser and target conditions to obtain high CE. An integrated numerical simulation code has been developed for the target design. The code agrees well with experimental results not only for CE but also for detailed EUV spectral structure. We propose a two-pulse irradiation scheme for high CE, and reduced ion debris using a carbon dioxide laser and a droplet or a punch-out target. Using our benchmarked numerical simulation code, we find a possibility to obtain CE up to 6–7%, which is more than twice that achieved to date. We discuss the reduction of ion energy within the two-pulse irradiation scheme. The mitigation of energetic ions by a magnetic field is also discussed, and we conclude that no serious instability occurs due to large ion gyroradius.

© 2008 American Institute of Physics

Article Outline

  1. INTRODUCTION
  2. POWER BALANCE MODEL OF CONVERSION EFFICIENCY
  3. INTEGRATED CODE DEVELOPMENT AND BENCHMARK
    1. Charge exchange spectroscopy and atomic codes
    2. Radiation hydrodynamic codes and benchmark
  4. FURTHER IMPROVEMENT OF CONVERSION EFFICIENCY BY THE DOUBLE PULSE IRRADIATION SCHEME
  5. ENERGETIC IONS AND THEIR MITIGATION BY MAGNETIC FIELD
    1. Reduction of ions energy
    2. Plasma expansion in magnetic field
  6. CONCLUSION

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KEYWORDS and PACS

Keywords

hydrodynamics, plasma production by laser, ultraviolet lithography

PACS

  • 32.30.Rj

    X-ray spectra

  • 52.25.Os

    Emission, absorption, and scattering of electromagnetic radiation

  • 52.35.Py

    Macroinstabilities (hydromagnetic, e.g., kink, fire-hose, mirror, ballooning, tearing, trapped-particle, flute, Rayleigh-Taylor, etc.)

  • 52.38.Ph

    X-ray, γ-ray, and particle generation

  • 52.50.Jm

    Plasma production and heating by laser beams (laser-foil, laser-cluster, etc.)

  • 52.55.Dy

    General theory and basic studies of plasma lifetime, particle and heat loss, energy balance, field structure, etc.

  • 52.59.-f

    Intense particle beams and radiation sources

  • 52.77.-j

    Plasma applications

ARTICLE DATA

Digital Object Identifier
http://dx.doi.org/10.1063/1.2907154

PUBLICATION DATA

ISSN

1070-664X (print)  
1089-7674 (online)

Publisher

$abstract.society.value is a Member of CrossRef American Institute of Physics

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